Delivers ultimate defect reduction in point-of-use photochemical dispense applications
Patented advanced two-stage dispense technology isolates filtration from dispense, maximizing defect reduction and improving yield without sacrificing dispense repeatability
A 50% footprint reduction saves valuable space in track equipment and enables two-stage performance in the same space as a single stage pump
Fill rate control and real-time pressure control maximize filter performance and prevent microbubble formation in even the most sensitive photochemicals
Dispense confirmation provides alarm notification of a partial or failed dispense, preventing costly wafer scrap due to coating problems
Constant pressure filtration optimizes filtration, minimizing defects and increasing yield
Brushless DC motor with closed-loop control delivers extreme repeatability at dispense rates down to 0.1 ml/sec
Disposable, self-contained Impact® 2 OF or Impact® Mini OF filters provide a clean connection and